It is used for removing the damaged layer of polysilicon wafer, flocking, cleaning and drying.
Equipment performance
Adjustable transmission speed:0.5-3m/min
Normal operating speed:2.5m/min
capacity: Up to 4000 Wafers/H@20mm
Up to 6800 Wafers/H@20mm
Up to 8000 Wafers/H@20mm
Effective utilization rate of equipment:≥98%
Etching depth range:3.5~4.5μm
Fragment rate:≤0.03%
Silicon wafer specification
Silicon wafer thickness: ≥ 140 μ m
Silicon wafer size: 156.75 * 156.75mm-212 * 212mm
Equipment size
Length * width * height: determine the size according to the model selection
transmission
Transmission type: 5 lane / 6 Lane
Shaft spacing: 60mm
Main drive shaft: 17mm, hexagon
Drive roller: Φ 32mm
direction
Working direction:Left→Right / Right→Left(TBD)
power supply
Power supply: AC380V 3Ph + PE + n 50Hz (TBD)
Control power supply: DC 24V
Full load power supply: 75A
Recommended maximum fuse size: 100A
Installation requirements
Minimum ground bearing capacity: 75kg / ㎡
Minimum workshop height: 3.5m
Clean room level: iso7 (10K class)
Ambient temperature: 17 ℃< RT < 30 ℃
Maximum humidity: 70%